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Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications: Vol. 23 (Thin Films) (in English)
Maurice H. Francombe (Author)
·
Academic Press
· Hardcover
Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications: Vol. 23 (Thin Films) (in English) - Maurice H. Francombe
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Synopsis "Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications: Vol. 23 (Thin Films) (in English)"
Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.
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All books in our catalog are Original.
The book is written in English.
The binding of this edition is Hardcover.
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