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atomic layer deposition (in English)
David Cameron
(Author)
·
Tommi Kääriäinen
(Author)
·
Marja-Leena Kääriäinen
(Author)
·
Wiley-Scrivener
· Hardcover
atomic layer deposition (in English) - Kääriäinen, Tommi ; Cameron, David ; Kääriäinen, Marja-Leena
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Synopsis "atomic layer deposition (in English)"
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
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All books in our catalog are Original.
The book is written in English.
The binding of this edition is Hardcover.
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