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Electrolytic In-Process Dressing (Elid) Technologies: Fundamentals and Applications (in English)
Ohmori, Hitoshi ; Marinescu, Ioan D. ; Katahira, Kazutoshi (Author)
·
CRC Press
· Paperback
Electrolytic In-Process Dressing (Elid) Technologies: Fundamentals and Applications (in English) - Ohmori, Hitoshi ; Marinescu, Ioan D. ; Katahira, Kazutoshi
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Origin: United Kingdom
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Synopsis "Electrolytic In-Process Dressing (Elid) Technologies: Fundamentals and Applications (in English)"
Edited by experts, one of whom developed the technology, Electrolytic In-Process Dressing (ELID) Technologies: Fundamentals and Applications provides an overview of ELID processes with correlations between the main parameters, describes ELID operations, and illustrates the concepts with case studies. The book's authoritative coverage of major concepts and applications of this emerging technology makes it a definitive reference.The book delineates the fundamentals, the chemistry and physics, and the hardware required by the process, then explores the application of ELID to different configurations of grinding. It discusses ELID grinding methods, lapping/grinding process, honing, and an original method of ELID grinding of free forms surfaces using an original design. The book also provides case studies in areas such as: Nano ultra-precision ELID and the latest developments in ELID nano-grinding Glass ceramic mirrors, small lens, and large scale optics New concept of micro-workshop, where all the machines tools and measurement devices are table-top machines with high accuracy Successful applications of ELID technology in the optics, semiconductor, mold and die, and micro-tools industries Surface modifications as a future method for obtaining complex modifications of surfaces by using ELID in combination with other methods Arguably the first comprehensive review of this emerging technology, this book combines information drawn from experts and the literature to provide a practical reference for the field. The editors have put together a resource that anticipates many of the questions that will arise from the investigation of ELID methods and applications.
