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nanolithography: a borderland between stm, eb, ib, and x-ray lithographies (in English)
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Synopsis "nanolithography: a borderland between stm, eb, ib, and x-ray lithographies (in English)"
success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. a new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (ebl), x-ray lithography (xrl), ion beam lithography (ibl) -- as well as on emergent techniques, such as scanning tunnelling lithography (stl).
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The book is written in English.
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