Share
Ion Implantation and Activation: Volume 3 (in English)
Kunihiro Suzuki
(Author)
·
Bentham Science Publishers
· Paperback
Ion Implantation and Activation: Volume 3 (in English) - Suzuki, Kunihiro
$ 88.80
$ 111.00
You save: $ 22.20
Choose the list to add your product or create one New List
✓ Product added successfully to the Wishlist.
Go to My WishlistsIt will be shipped from our warehouse between
Thursday, June 13 and
Friday, June 14.
You will receive it anywhere in United States between 1 and 3 business days after shipment.
Synopsis "Ion Implantation and Activation: Volume 3 (in English)"
Ion Implantation and Activation - Volume 3 presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental processes and moving up into the more advanced theories.Ion implantation can be expressed theoretically as a binary collision, and, experimentally using various mathematical functions. Readers can understand how to establish an ion implantation database by combining theory and experimental data. The third volume of the series describes the diffusion phenomenon under the thermal equilibrium on point defect concentration and the features of transient enhanced diffusion (TED). The volume also presents methods for the oxidation and redistribution of impurities in polycrystalline silicon for extraction as well as some analytical models related to the VLSI process. This book provides advanced engineering and physics students and researchers with complete and coherent coverage of modern semiconductor process modeling. Readers can also benefit from this volume by acquiring the necessary information to improve contemporary process models by themselves.
- 0% (0)
- 0% (0)
- 0% (0)
- 0% (0)
- 0% (0)
All books in our catalog are Original.
The book is written in English.
The binding of this edition is Paperback.
✓ Producto agregado correctamente al carro, Ir a Pagar.