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portada Photomask Fabrication Technology (Professional Engineering) (in English)
Type
Physical Book
Publisher
Author
Year
2005
Language
English
Pages
500
Format
Hardcover
Weight
2.05
ISBN13
9780071445634
Edition No.
1
Categories

Photomask Fabrication Technology (Professional Engineering) (in English)

Benjamin Eynon; Banqiu Wu (Author) · Editorial Mcgraw-Hill · Hardcover

Photomask Fabrication Technology (Professional Engineering) (in English) - Benjamin Eynon; Banqiu Wu

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Synopsis "Photomask Fabrication Technology (Professional Engineering) (in English)"

Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product.Photomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool’s source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technologists are necessary to fabricate modern microelectronics. Thus the rapid recent growth of the field and the need for this book.This text details the science and technology of industrial photomask production, including fundamental principles, industrial production flows, technological evolution and development, and state of the art technologies. Focusing on industrial applications rather than pure science, the goal of the book is to provide a comprehensive reference for any engineer developing microelectronic manufacturing processes

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